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Quartz crystal microbalance for real-time monitoring chlorosilane gas transport in slim vertical cold wall chemical vapor deposition reactor
http://hdl.handle.net/10131/00012906
http://hdl.handle.net/10131/0001290665a4963e-cb07-4942-856e-4377f9160e2c
| 名前 / ファイル | ライセンス | アクション |
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MM_QCM.pdf (4.2 MB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||||||||||||||||||||
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| 公開日 | 2020-02-18 | |||||||||||||||||||||||
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| タイトル | Quartz crystal microbalance for real-time monitoring chlorosilane gas transport in slim vertical cold wall chemical vapor deposition reactor | |||||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||||
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| 言語 | eng | |||||||||||||||||||||||
| キーワード | ||||||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||||
| 主題Scheme | Other | |||||||||||||||||||||||
| 主題 | Minimal fab; Chemical vapor deposition reactor; Quartz crystal microbalance; Silicon epitaxial growth; Trichlorosilane; Dichlorosilane | |||||||||||||||||||||||
| 資源タイプ | ||||||||||||||||||||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||||||||||
| 資源タイプ | journal article | |||||||||||||||||||||||
| アクセス権 | ||||||||||||||||||||||||
| アクセス権 | open access | |||||||||||||||||||||||
| アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||||||||||||
| 著者 |
Takahashi, Toshinori
× Takahashi, Toshinori
× Otani, Mana
× Muroi, Mitsuko
× Irikura, Kenta
× Matsuo, Miya
× Yamada, Ayami
× Habuka, Hitoshi× Ishida, Yuuki
ORCID
0000-0002-6567-348X
× Ikeda, Shin-Ichi
× Hara, Shiro
ORCID
0000-0002-1136-1624
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| 内容記述タイプ | Abstract | |||||||||||||||||||||||
| 内容記述 | Chlorosilane gas transport in ambient hydrogen in a slim vertical cold wall chemical vapor deposition reactor was real-time monitored using a quartz crystal microbalance (QCM) using its behaviour responding to the properties of the gas mixture. The QCM frequency quickly decreased by introducing the trichlorosilane gas, while it slowly decreased by the dichlorosilane gas. The QCM frequency behavior was explained by the gas flow condition, such as the plug flow and recirculating flow, in the reactor. The relationship was consistent with the gas flow calculations, because the heavy and light gases could directly flow downward and recirculate, respectively, in the chamber due to natural convection. The information obtained from the QCM frequency behavior is expected to be utilized for the real-time gas monitoring and for the process design. | |||||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||||
| 書誌情報 |
en : Materials Science in Semiconductor Processing 巻 106, ページ数 5, 発行日 2020-02-01 |
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| 収録物識別子タイプ | PISSN | |||||||||||||||||||||||
| 収録物識別子 | 13698001 | |||||||||||||||||||||||
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| 関連タイプ | isVersionOf | |||||||||||||||||||||||
| 識別子タイプ | DOI | |||||||||||||||||||||||
| 関連識別子 | https://doi.org/10.1016/j.mssp.2019.104759 | |||||||||||||||||||||||
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| 出版タイプ | AM | |||||||||||||||||||||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||||||||||||||||||||
| 出版者 | ||||||||||||||||||||||||
| 出版者 | Elsevier Sci Ltd | |||||||||||||||||||||||
| 言語 | en | |||||||||||||||||||||||
