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Bulk image effects of photoresist in three-dimensional profile simulation
http://hdl.handle.net/10131/7892
http://hdl.handle.net/10131/78924261c96a-5cc6-4e78-a713-9100cb82f231
名前 / ファイル | ライセンス | アクション |
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BulkImageEffectsOfPhotoresist.pdf (1.5 MB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2012-03-22 | |||||
タイトル | ||||||
タイトル | Bulk image effects of photoresist in three-dimensional profile simulation | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Ishizuka, Tatsumi
× Ishizuka, Tatsumi |
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著者(ヨミ) | ||||||
識別子Scheme | WEKO | |||||
識別子 | 27804 | |||||
姓名 | イシズカ, タツミ | |||||
著者所属 | ||||||
Fuji Research Institute Corporation | ||||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | 3D bulk image effects in high-NA lens lithography are studied through 3D exposure and development simulations by applying a Mack model to the 3D exposure process. | |||||
書誌情報 |
Compel 巻 10, 号 4, p. 389-400, 発行日 1991 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 03321649 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA10003146 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.1108/eb051715 | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
出版者 | ||||||
出版者 | James & James Science Publishers Ltd |