@article{oai:ynu.repo.nii.ac.jp:00005638,
 author = {Ishizuka, Tatsumi},
 issue = {4},
 journal = {Compel},
 month = {},
 note = {application/pdf, 3D bulk image effects in high-NA lens lithography are studied through 3D exposure and development simulations by applying a Mack model to the 3D exposure process.},
 pages = {389--400},
 title = {Bulk image effects of photoresist in three-dimensional profile simulation},
 volume = {10},
 year = {1991}
}