{"created":"2023-06-20T15:11:14.628734+00:00","id":7624,"links":{},"metadata":{"_buckets":{"deposit":"0db3f454-a951-4fe8-b26f-c98072af4fb5"},"_deposit":{"created_by":3,"id":"7624","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"7624"},"status":"published"},"_oai":{"id":"oai:ynu.repo.nii.ac.jp:00007624","sets":["495:496"]},"author_link":["30785","30788","30780","714","30797","30786","30782","30781","30784","30787","30790","30791","30792","30793","30794","30796"],"item_2_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2016-11-14","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"20","bibliographicPageEnd":"204101-5","bibliographicPageStart":"204101-1","bibliographicVolumeNumber":"109","bibliographic_titles":[{"bibliographic_title":"Applied Physics Letters"}]}]},"item_2_description_42":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"Article","subitem_description_type":"Other"}]},"item_2_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Effects of initial roughness on the evolution of plasma-induced surface roughness have been investigated during Si etching in inductively coupled Cl2 plasmas, as a function of rf bias power or ion incident energy in the range Ei ≈ 20–500 eV. Experiments showed that smoothing of initially rough surfaces as well as non-roughening of initially planar surfaces can be achieved by plasma etching in the smoothing mode (at high Ei) with some threshold for the initial roughness, above which laterally extended crater-like features were observed to evolve during smoothing. Monte Carlo simulations of the surface feature evolution indicated that the smoothing/non-roughening is attributed primarily to reduced effects of the ion scattering or reflection from microscopically roughened feature surfaces on incidence.","subitem_description_type":"Abstract"}]},"item_2_full_name_2":{"attribute_name":"著者(ヨミ)","attribute_value_mlt":[{"nameIdentifiers":[{}],"names":[{"name":"中崎, 暢也"}]},{"nameIdentifiers":[{}],"names":[{"name":"松本, 悠"}]},{"nameIdentifiers":[{}],"names":[{"name":"津田, 博隆"}]},{"nameIdentifiers":[{},{}],"names":[{"name":"鷹尾, 祥典"}]},{"nameIdentifiers":[{}],"names":[{"name":"江利口, 浩二"}]},{"nameIdentifiers":[{}],"names":[{"name":"斧, 髙一"}]}]},"item_2_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{}],"names":[{}]},{"nameIdentifiers":[{}],"names":[{}]},{"nameIdentifiers":[{}],"names":[{}]},{"nameIdentifiers":[{},{}],"names":[{}]},{"nameIdentifiers":[{}],"names":[{}]},{"nameIdentifiers":[{}],"names":[{}]}]},"item_2_relation_13":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"info:doi/10.1063/1.4967474","subitem_relation_type_select":"DOI"}}]},"item_2_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00543431","subitem_source_identifier_type":"NCID"}]},"item_2_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"00036951","subitem_source_identifier_type":"ISSN"}]},"item_2_version_type_18":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Nakazaki, Nobuya"}],"nameIdentifiers":[{"nameIdentifier":"30780","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Matsumoto, Haruka"}],"nameIdentifiers":[{"nameIdentifier":"30781","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Tsuda, Hirotaka"}],"nameIdentifiers":[{"nameIdentifier":"30782","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Takao, Yoshinori"}],"nameIdentifiers":[{"nameIdentifier":"714","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"80552661","nameIdentifierScheme":"e-Rad","nameIdentifierURI":"https://kaken.nii.ac.jp/ja/search/?qm=80552661"}]},{"creatorNames":[{"creatorName":"Eriguchi, Koji"}],"nameIdentifiers":[{"nameIdentifier":"30784","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Ono, Kouichi"}],"nameIdentifiers":[{"nameIdentifier":"30785","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-02-15"}],"displaytype":"detail","filename":"takao_apl.pdf","filesize":[{"value":"2.2 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"takao_apl.pdf","url":"https://ynu.repo.nii.ac.jp/record/7624/files/takao_apl.pdf"},"version_id":"f11f39b1-f685-4e3c-a287-0ec1f36a19c1"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Surface smoothing during plasma etching of Si in Cl2","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Surface smoothing during plasma etching of Si in Cl2"}]},"item_type_id":"2","owner":"3","path":["496"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-02-15"},"publish_date":"2017-02-15","publish_status":"0","recid":"7624","relation_version_is_last":true,"title":["Surface smoothing during plasma etching of Si in Cl2"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-06-20T19:32:52.607589+00:00"}