{"created":"2023-06-20T15:09:38.912188+00:00","id":5637,"links":{},"metadata":{"_buckets":{"deposit":"03f112b7-5a51-417b-aef8-f3bf3a91c932"},"_deposit":{"created_by":3,"id":"5637","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"5637"},"status":"published"},"_oai":{"id":"oai:ynu.repo.nii.ac.jp:00005637","sets":["561:562"]},"author_link":["27802","27800","27801"],"item_2_alternative_title_21":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Three-dimensional simulation in photoresist development"}]},"item_2_biblio_info_8":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1990-11","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"11","bibliographicPageEnd":"785","bibliographicPageStart":"775","bibliographicVolumeNumber":"J73-C-II","bibliographic_titles":[{"bibliographic_title":"電子情報通信学会論文誌"}]}]},"item_2_description_17":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_2_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"半導体集積回路の微細化に伴いデバイス構造を正確に予測するためのシミュレーションが重要になってきている.光を用いたリソグラフィを行う場合,波長による解像力の限界があり,所定のパターンを得るためにはリソグラフィシミュレーションによる最適設計が重要となる.しかしながら,現像時のレジスト表面形状は光の干渉効果による定在波の影響で非常に複雑となり,3次元形状計算が安定的かつ高精度に行える手法が望まれている.本論文では,現像時の3次元形状シミュレーションの新しい手法(ネットワーク法)とその計算結果を報告する.最初に,四面体分割によるネットワークの構成方法を説明する.次に,ネットワーク上の点の移動による現像界面の進行解析手法を示す.この手法の特徴としては,次のようなものがある.界面全体の面情報をもたずにネットワーク上の点だけから現像方向を決定するようにアルゴリズムの工夫がされている.このアルゴリズムはストリングモデルのような特異点(面のループ)消去の必要がなく,安定に複雑な界面形状の計算ができる.最後に,定在波効果が顕著な場合に,安定に3次元現像計算が行えることを示す.","subitem_description_type":"Abstract"}]},"item_2_full_name_2":{"attribute_name":"著者(ヨミ)","attribute_value_mlt":[{"nameIdentifiers":[{}],"names":[{"name":"イシヅカ, タツミ"}]}]},"item_2_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{}],"names":[{}]}]},"item_2_publisher_35":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"電子情報通信学会"}]},"item_2_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN10071294","subitem_source_identifier_type":"NCID"}]},"item_2_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09151907","subitem_source_identifier_type":"ISSN"}]},"item_2_text_4":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"(株)富士総合研究所"}]},"item_2_version_type_18":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"石塚, 辰美"}],"nameIdentifiers":[{"nameIdentifier":"27800","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-09-21"}],"displaytype":"detail","filename":"113.pdf","filesize":[{"value":"854.1 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"113.pdf","url":"https://ynu.repo.nii.ac.jp/record/5637/files/113.pdf"},"version_id":"5c0d48c2-e022-4886-ae83-76e225410c6a"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"光レジスト現像時の3次元形状シミュレーション","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"光レジスト現像時の3次元形状シミュレーション"}]},"item_type_id":"2","owner":"3","path":["562"],"pubdate":{"attribute_name":"公開日","attribute_value":"2010-02-22"},"publish_date":"2010-02-22","publish_status":"0","recid":"5637","relation_version_is_last":true,"title":["光レジスト現像時の3次元形状シミュレーション"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-06-20T21:01:06.970003+00:00"}