@article{oai:ynu.repo.nii.ac.jp:00004186,
 author = {Takao, Yoshinori and Matsuoka, Kenji and Eriguchi, Koji and Ono, Kouichi},
 issue = {8S1},
 journal = {Japanese Journal of Applied Physics},
 month = {Aug},
 note = {A numerical study of low-pressure capacitively coupled plasma (CCP) discharges in Ar has been performed including the transport of ions in a sheath onto a substrate. We employ a two-dimensional axisymmetric particle-in-cell with a Monte Carlo collision (PIC-MCC) method for an asymmetric capacitive discharge with an external electrical circuit containing a blocking capacitor and an rf power supply. The PIC-MCC results show that for the gas pressure (5-100 mTorr), rf voltage (50?500 V), and frequency (6.78?40.68 MHz) ranges examined for a single-frequency CCP, the peak plasma density increases linearly with gas pressure, rf voltage, and frequency squared. With a decrease in pressure or increases in plasma density and sheath potential, the sheath becomes less collisional and thus significant peaks at high energies of ion energy distributions appear and narrow ion angular distributions are obtained. The tendency is in a reasonable agreement with experimental results.},
 title = {Particle Simulations of Sheath Dynamics in Low-Pressure Capacitively Coupled Argon Plasma Discharges},
 volume = {50},
 year = {2011}
}