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Etching of silicon carbide using chlorine trifluoride gas
http://hdl.handle.net/10131/8242
http://hdl.handle.net/10131/8242436b34f0-9e65-499d-a375-5f245177e606
名前 / ファイル | ライセンス | アクション |
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InTech-Habuka2012.pdf (2.7 MB)
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Item type | 図書 / Book(1) | |||||
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公開日 | 2013-01-08 | |||||
タイトル | ||||||
タイトル | Etching of silicon carbide using chlorine trifluoride gas | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_2f33 | |||||
資源タイプ | book | |||||
著者 |
Habuka, Hitoshi
× Habuka, Hitoshi |
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著者(ヨミ) | ||||||
識別子Scheme | WEKO | |||||
識別子 | 18800 | |||||
姓名 | ハブカ, ヒトシ | |||||
著者別名 | ||||||
識別子Scheme | WEKO | |||||
識別子 | 18801 | |||||
姓名 | 羽深, 等 | |||||
書誌情報 |
Physics and Technology of Silicon Carbide Devices 発行日 2012 |
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ISBN | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | ISBN | |||||
関連識別子 | 978-953-51-0917-4 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.5772/50387 | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
出版者 | ||||||
出版者 | InTech | |||||
資源タイプ | ||||||
内容記述タイプ | Other | |||||
内容記述 | Book |