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Deposition and etching behaviour of boron trichloride gas at silicon surface
http://hdl.handle.net/10131/00012907
http://hdl.handle.net/10131/000129073d75bb8f-ab95-46e1-991b-9c487d4b1ce6
名前 / ファイル | ライセンス | アクション |
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BCL3.pdf (179.5 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2020-02-18 | |||||
タイトル | ||||||
タイトル | Deposition and etching behaviour of boron trichloride gas at silicon surface | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題 | A1. Doping, A1. Etching, A1. Surface processes, A3. Chemical vapor deposition processes, B1. Elemental solid, B2. Semiconductor silicon | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Muroi, Mitsuko
× Muroi, Mitsuko× Yamada, Ayami× Saito, Ayumi× Habuka, Hitoshi |
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著者所属 | ||||||
Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan | ||||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | The deposition and etching at a silicon surface by boron trichloride gas were overviewed in a wide temperature range using a chemical vapour deposition reactor. At temperatures lower than 800 °C, while the silicon surface was covered with boron, the formed film thickness was ignorable. At 900 °C, the boron deposition rate increased to 0.25 μm min^(−1). In the temperature range between 900 and 1000 °C, the boron film formation was considerable. In contrast, at 1100 °C, the silicon surface was etched at 0.36 μm min^(−1). At temperatures higher than 1050 °C, while etching occurred along with producing chlorosilanes, the silicon surface after the etching was still covered with boron. Boron deposition and silicon etching might simultaneously occur at high temperatures by the boron trichloride gas. By adjusting the surface temperature to 800 °C, boron and silicon co-deposition was possible using the gas mixture of dichlorosilane and boron trichloride. | |||||
書誌情報 |
Journal of Crystal Growth 巻 529, p. 125301, 発行日 2020-01 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 00220248 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA00696341 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | info:doi/10.1016/j.jcrysgro.2019.125301 | |||||
著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
出版者 | ||||||
出版者 | Elsevier |